84199080 (01/2002-12/2005) Parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)

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CN 84199080 / Exports / Unit = Prices (Euro/ ton) / Partner: France / Reporter: European Union /84199080:Parts of Machinery, Plant and Laboratory Equipment, Whether or not Electrically Heated, for the Treatment of Materials by a Process Involving a Change of Temperature, and of Non-electric Instantaneous and Storage Water Heaters, N.e.s. (Excl. of Heat Exchange Units for Civil Aircraft of Subheading 8419.90.10, of Sterilizers of Subheading 8419.20.00, and of Apparatus for Rapid Heating, for Deposition and for Physical Deposition by Electronic Beam or Evaporation on Semiconductor Wafers and for Chemical Vapour Deposition on lcd Substrates, and of Furnaces, Ovens and Other Equipment of Heading 8514)
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CN 84199080 / Exports / Unit = Prices (Euro/ ton) / Partner: Belgium/ Luxembourg / Reporter: European Union /84199080:Parts of Machinery, Plant and Laboratory Equipment, Whether or not Electrically Heated, for the Treatment of Materials by a Process Involving a Change of Temperature, and of Non-electric Instantaneous and Storage Water Heaters, N.e.s. (Excl. of Heat Exchange Units for Civil Aircraft of Subheading 8419.90.10, of Sterilizers of Subheading 8419.20.00, and of Apparatus for Rapid Heating, for Deposition and for Physical Deposition by Electronic Beam or Evaporation on Semiconductor Wafers and for Chemical Vapour Deposition on lcd Substrates, and of Furnaces, Ovens and Other Equipment of Heading 8514)
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CN 84199080 / Exports / Unit = Prices (Euro/ ton) / Partner: Netherlands / Reporter: European Union /84199080:Parts of Machinery, Plant and Laboratory Equipment, Whether or not Electrically Heated, for the Treatment of Materials by a Process Involving a Change of Temperature, and of Non-electric Instantaneous and Storage Water Heaters, N.e.s. (Excl. of Heat Exchange Units for Civil Aircraft of Subheading 8419.90.10, of Sterilizers of Subheading 8419.20.00, and of Apparatus for Rapid Heating, for Deposition and for Physical Deposition by Electronic Beam or Evaporation on Semiconductor Wafers and for Chemical Vapour Deposition on lcd Substrates, and of Furnaces, Ovens and Other Equipment of Heading 8514)
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CN 84199080 / Exports / Unit = Prices (Euro/ ton) / Partner: Germany / Reporter: European Union /84199080:Parts of Machinery, Plant and Laboratory Equipment, Whether or not Electrically Heated, for the Treatment of Materials by a Process Involving a Change of Temperature, and of Non-electric Instantaneous and Storage Water Heaters, N.e.s. (Excl. of Heat Exchange Units for Civil Aircraft of Subheading 8419.90.10, of Sterilizers of Subheading 8419.20.00, and of Apparatus for Rapid Heating, for Deposition and for Physical Deposition by Electronic Beam or Evaporation on Semiconductor Wafers and for Chemical Vapour Deposition on lcd Substrates, and of Furnaces, Ovens and Other Equipment of Heading 8514)
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CN 84199080 / Exports / Unit = Prices (Euro/ ton) / Partner: Italy / Reporter: European Union /84199080:Parts of Machinery, Plant and Laboratory Equipment, Whether or not Electrically Heated, for the Treatment of Materials by a Process Involving a Change of Temperature, and of Non-electric Instantaneous and Storage Water Heaters, N.e.s. (Excl. of Heat Exchange Units for Civil Aircraft of Subheading 8419.90.10, of Sterilizers of Subheading 8419.20.00, and of Apparatus for Rapid Heating, for Deposition and for Physical Deposition by Electronic Beam or Evaporation on Semiconductor Wafers and for Chemical Vapour Deposition on lcd Substrates, and of Furnaces, Ovens and Other Equipment of Heading 8514)
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CN 84199080 / Exports / Unit = Prices (Euro/ ton) / Partner: United Kingdom / Reporter: European Union /84199080:Parts of Machinery, Plant and Laboratory Equipment, Whether or not Electrically Heated, for the Treatment of Materials by a Process Involving a Change of Temperature, and of Non-electric Instantaneous and Storage Water Heaters, N.e.s. (Excl. of Heat Exchange Units for Civil Aircraft of Subheading 8419.90.10, of Sterilizers of Subheading 8419.20.00, and of Apparatus for Rapid Heating, for Deposition and for Physical Deposition by Electronic Beam or Evaporation on Semiconductor Wafers and for Chemical Vapour Deposition on lcd Substrates, and of Furnaces, Ovens and Other Equipment of Heading 8514)
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CN 84199080 / Exports / Unit = Prices (Euro/ ton) / Partner: Ireland / Reporter: European Union /84199080:Parts of Machinery, Plant and Laboratory Equipment, Whether or not Electrically Heated, for the Treatment of Materials by a Process Involving a Change of Temperature, and of Non-electric Instantaneous and Storage Water Heaters, N.e.s. (Excl. of Heat Exchange Units for Civil Aircraft of Subheading 8419.90.10, of Sterilizers of Subheading 8419.20.00, and of Apparatus for Rapid Heating, for Deposition and for Physical Deposition by Electronic Beam or Evaporation on Semiconductor Wafers and for Chemical Vapour Deposition on lcd Substrates, and of Furnaces, Ovens and Other Equipment of Heading 8514)
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CN 84199080 / Exports / Unit = Prices (Euro/ ton) / Partner: Denmark / Reporter: European Union /84199080:Parts of Machinery, Plant and Laboratory Equipment, Whether or not Electrically Heated, for the Treatment of Materials by a Process Involving a Change of Temperature, and of Non-electric Instantaneous and Storage Water Heaters, N.e.s. (Excl. of Heat Exchange Units for Civil Aircraft of Subheading 8419.90.10, of Sterilizers of Subheading 8419.20.00, and of Apparatus for Rapid Heating, for Deposition and for Physical Deposition by Electronic Beam or Evaporation on Semiconductor Wafers and for Chemical Vapour Deposition on lcd Substrates, and of Furnaces, Ovens and Other Equipment of Heading 8514)
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