37061091 (01/1988-12/2011) Negatives and intermediate positives of cinematographic film, exposed and developed, whether or not incorporating soundtrack, width >= 35 mm

Source: Eurostat, Luxembourg

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Available Time Series

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CN 70200005 / Exports / Unit = Prices (Euro/ ton) / Partner: France / Reporter: Eur27_2020 /70200005:Quartz Reactor Tubes and Holders Designed for Insertion Into Diffusion and Oxidation Furnaces for Production of Semiconductor Materials
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CN 70200005 / Exports / Unit = Prices (Euro/ ton) / Partner: Belgium/ Luxembourg / Reporter: Eur27 /70200005:Quartz Reactor Tubes and Holders Designed for Insertion Into Diffusion and Oxidation Furnaces for Production of Semiconductor Materials
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CN 70200005 / Exports / Unit = Prices (Euro/ ton) / Partner: Netherlands / Reporter: Eur27_2020 /70200005:Quartz Reactor Tubes and Holders Designed for Insertion Into Diffusion and Oxidation Furnaces for Production of Semiconductor Materials
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CN 70200005 / Exports / Unit = Prices (Euro/ ton) / Partner: Germany / Reporter: Eur27_2020 /70200005:Quartz Reactor Tubes and Holders Designed for Insertion Into Diffusion and Oxidation Furnaces for Production of Semiconductor Materials
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CN 70200005 / Exports / Unit = Prices (Euro/ ton) / Partner: Italy / Reporter: Eur27_2020 /70200005:Quartz Reactor Tubes and Holders Designed for Insertion Into Diffusion and Oxidation Furnaces for Production of Semiconductor Materials
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CN 70200005 / Exports / Unit = Prices (Euro/ ton) / Partner: United Kingdom / Reporter: Eur27_2020 /70200005:Quartz Reactor Tubes and Holders Designed for Insertion Into Diffusion and Oxidation Furnaces for Production of Semiconductor Materials
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CN 70200005 / Exports / Unit = Prices (Euro/ ton) / Partner: Ireland / Reporter: Eur27_2020 /70200005:Quartz Reactor Tubes and Holders Designed for Insertion Into Diffusion and Oxidation Furnaces for Production of Semiconductor Materials
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CN 70200005 / Exports / Unit = Prices (Euro/ ton) / Partner: Denmark / Reporter: Eur27_2020 /70200005:Quartz Reactor Tubes and Holders Designed for Insertion Into Diffusion and Oxidation Furnaces for Production of Semiconductor Materials
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