90172039 (01/1998-..) Marking-out instruments

Source: Eurostat, Luxembourg

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CN 90172031 / Exports / Unit = Prices (Euro/ suppl. units) / Partner: France / Reporter: European Union /90172031:Marking-out Instruments as Pattern Generating Apparatus of a Kind Used for Producing Masks or Reticles From Photoresist Coated Substrates
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CN 90172031 / Exports / Unit = Prices (Euro/ suppl. units) / Partner: Belgium/ Luxembourg / Reporter: European Union /90172031:Marking-out Instruments as Pattern Generating Apparatus of a Kind Used for Producing Masks or Reticles From Photoresist Coated Substrates
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CN 90172031 / Exports / Unit = Prices (Euro/ suppl. units) / Partner: Netherlands / Reporter: European Union /90172031:Marking-out Instruments as Pattern Generating Apparatus of a Kind Used for Producing Masks or Reticles From Photoresist Coated Substrates
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CN 90172031 / Exports / Unit = Prices (Euro/ suppl. units) / Partner: Germany / Reporter: European Union /90172031:Marking-out Instruments as Pattern Generating Apparatus of a Kind Used for Producing Masks or Reticles From Photoresist Coated Substrates
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CN 90172031 / Exports / Unit = Prices (Euro/ suppl. units) / Partner: Italy / Reporter: European Union /90172031:Marking-out Instruments as Pattern Generating Apparatus of a Kind Used for Producing Masks or Reticles From Photoresist Coated Substrates
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CN 90172031 / Exports / Unit = Prices (Euro/ suppl. units) / Partner: United Kingdom / Reporter: European Union /90172031:Marking-out Instruments as Pattern Generating Apparatus of a Kind Used for Producing Masks or Reticles From Photoresist Coated Substrates
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CN 90172031 / Exports / Unit = Prices (Euro/ suppl. units) / Partner: Ireland / Reporter: European Union /90172031:Marking-out Instruments as Pattern Generating Apparatus of a Kind Used for Producing Masks or Reticles From Photoresist Coated Substrates
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CN 90172031 / Exports / Unit = Prices (Euro/ suppl. units) / Partner: Denmark / Reporter: European Union /90172031:Marking-out Instruments as Pattern Generating Apparatus of a Kind Used for Producing Masks or Reticles From Photoresist Coated Substrates
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